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Oral Qualifying Exam on Atomic Processes on Surfaces

This exam encompasses the fundamental statistical thermodynamics and kinetics needed to understand adsorption, desorption, diffusion, step-motion, crystal growth, and surface chemical reactions on clean crystal surfaces of metals, semiconductors, and oxides.

NON-EXHAUSTIVE TOPICAL AREAS

• Techniques for characterizing structure and composition of crystal surfaces
• Techniques used for characterizing adsorption
• Statistical thermodynamics of physical and chemical adsorption
• Kinetics of condensation, evaporation, and surface diffusion
• Atomic events in crystal and film growth, and in surface reactions

LEVEL

Introductory graduate

STANDARD TEXT

J. A. Venables, "Introduction to Surface and Thin Film Processes"